Electrochemical Characterization of the Influence of Scanning Number on the Self-assembled Monolayer Formed by Schiff Base

 

K. Ding ^a,b)*, Q. Wang,^a) Z. Jia,^a) R. Tong,^a) X. Wang ^b)

^a)Department of Chemistry， Hebei Teacher’s University，Shijiazhuang 050016, China.

Received 27 September 2002; accepted in revised form 18 August 2003

Abstract

The influence of potential-scan number on the Schiff base self-assembled monolayer was probed by the Cyclic Voltammetry (CV) and Electrochemical Impedance Spectroscopy (EIS) techniques for the first time. The results showed that the charge transferring resistance (R_ct) could be reduced with the potential-scan, suggesting that the structure of the self-assembled monolayer was altered. Also, the relationship between the content of C=N group, represented approximately by the reduction electric charge (Qr), and the monolayer’s packing degree which was represented by the value of R_ct, was described. Providing a new way to change the interface characterization is the main contribution of this paper

Keywords: number, influence, self-assembled monolayers, Schiff.

 

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*Corresponding author. E-mail address: dkeqiang@263.net