Abstract

DING, K. et al. Port. Electrochim. Acta [online]. 2003, vol.21, n.3, pp.225-234. ISSN 0872-1904.

The influence of potential-scan number on the Schiff base self-assembled monolayer was probed by the Cyclic Voltammetry (CV) and Electrochemical Impedance Spectroscopy (EIS) techniques for the first time. The results showed that the charge transferring resistance (R_ct) could be reduced with the potential-scan, suggesting that the structure of the self-assembled monolayer was altered. Also, the relationship between the content of C=N group, represented approximately by the reduction electric charge (Qr), and the monolayer’s packing degree which was represented by the value of R_ct, was described. Providing a new way to change the interface characterization is the main contribution of this paper.

Keywords : number; influence; self-assembled monolayers; Schiff.

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