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Portugaliae Electrochimica Acta
versión impresa ISSN 0872-1904
Resumen
FOUDA, A.S.; MOSTAFA, H.A. y MOUSSA, M.N.. Corrosion Inhibition of Electrodeposited Tellurium and Palladium in Nitric Acid Solution . Port. Electrochim. Acta [online]. 2005, vol.23, n.2, pp.275-287. ISSN 0872-1904.
Corrosion inhibition of 3-phenyl hydrazonoacetyl acetone derivatives on electrodeposited tellurium and palladium in nitric acid was measured by using electrochemical method. Polarization curves showed that these compounds are cathodic inhibitors. The inhibition appears to function through general adsorption following the Flory-Huggins adsorption isotherm. The rate of corrosion depends on the nature of the inhibitor and its concentration, mode of interaction with the metal surface, molecular size, formation of complexes and the active center in the molecules and its electron charge density. Also, ΔGoads. values were calculated. The reaction rate was found to be proportional to the absolute value of the Hammett constant (s).
Palabras clave : tellurium; palladium; corrosion inhibition; phenyl hydrazonoacetyl acetone; nitric acid.