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Portugaliae Electrochimica Acta

Print version ISSN 0872-1904

Port. Electrochim. Acta vol.24 no.4 Coimbra  2006

 

New alkaline copper electroplating bath based on an inorganic complexing agent

Masoud Rafizadeh,a Majid Bahmani,b,* Reza T. Chelarasa

a) Department of Chemistry, University of Tarbiat Moalem, Shahid Mofateh Street, Tehran, Iran

b)Research Institute of Petroleum Industry, Catalyst Division, P.O. Box: 18745-4163, Pazhooheshgah Blvd. Khairabad, Old Qom Road, Tehran, Iran

 

Received 25 September 2004, accepted October 2006

 

Abstract

A new alkaline electrolytic solution based on ammonia for copper electroplating has been investigated. Upon addition of alkaline metal hydroxide solution and ammonia followed by the immediate addition of a strong inorganic acid, a highly exothermic reaction takes place. At optimum solution condition ammonia remains in solution as NH2 and forms a complexing agent.

Keywords: copper electroplating, alkaline bath, non-cyanide.

 

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References

1.     V.A. Lamb, D.R. Valentine, Plating 52 (1965) 1289.         [ Links ]

2.     V.A. Lamb, D.R. Valentine, Plating 53 (1966) 86.

3.     V.A. Lamb, D.R. Valentine, C.E. Johnson, J. Electrochem. Soc. 117 (1970) C291, C341.

4.     U. Bertoucci and D.R. Turner, in A.J. Bard (Ed.), ‘Encyclopedia of Elements’, (1974) II-6, p. 465.

5.     F.A. Lowenheim. “Modern Electroplating”, John Wiley & Sons, New York, 1974.

6.     N.V. Parthasaradhy, “Practical Electroplating”, Practice Hall, NJ, 1989.

7.     D. Chu, P.S. Fedkiw, J. Electroanal. Chem. 345 (1993) 107.

8.     R.E. Sinitski, V. Srinivasan, R. Haynes, J. Electrochem. Soc. 127 (1980) 47.

9.     J. Horner, Plat. Surf. Finish. 85 (1998) 42.

10.   R.Y. Ying, R. Moy, L.C. Fraser, S. O’Bannion, F.M. Donahue, J. Electrochem. Soc. 135 (1988) 654.

11.   F.M. Donahue, J. Electrochem. Soc. 127 (1980) 51.

12.   F.M. Donahue, K.L.M. Wong, R. Bhala, J. Electrochem. Soc. (1980) 2340.

13.   F.M. Donahue, D.J. Sajkowski, A.C. Bosio, L.L. Schafer, J. Electrochem. Soc. 129 (1982) 717.

14.   M. Matsuoka, J. Murai, C. Iwakura, J. Electrochem. Soc. 139 (1992) 2466.

15.   V. Alvarez, S. Gonzalez, A. Arevalo, Electrochim Acta 29 (1984) 1187.

16.   D. Stoychev, C. Tsvetanov, J. Appl. Electrochem. 26 (1996)

17.   J.C. Fabricius, K. Kontturi, G. Sundholm, J. Appl. Electrochem. 26 (1996) 1179.

18.   Y. Shingaya, H. Matsumoto and M. Ito, Surf. Sci. 335 (1995).

19.   V.A. Lamb, D.R. Valentine and C.E. Johnson, J. Electrochem. Soc. 117 (1970) C291, C341.

20.   L.G. Durney. “Electroplating Engineering Handbook”, 4th edition, 1984.

21.   McCoy, U.S. Patent, 2,411, 674, 1946.

 

*Corresponding author. E-mail address: bahmani61@yahoo.com

 

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