<?xml version="1.0" encoding="ISO-8859-1"?><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<front>
<journal-meta>
<journal-id>0872-1904</journal-id>
<journal-title><![CDATA[Portugaliae Electrochimica Acta]]></journal-title>
<abbrev-journal-title><![CDATA[Port. Electrochim. Acta]]></abbrev-journal-title>
<issn>0872-1904</issn>
<publisher>
<publisher-name><![CDATA[Sociedade Portuguesa de Electroquímica]]></publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id>S0872-19042009000600008</article-id>
<title-group>
<article-title xml:lang="en"><![CDATA[Voltammetric Studies on the Role of Additives in Bright Zinc Electrodeposition from an Alkaline Non-Cyanide Bath]]></article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Shanmugasigamani]]></surname>
<given-names><![CDATA[S.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Pushpavanam]]></surname>
<given-names><![CDATA[M.]]></given-names>
</name>
<xref ref-type="aff" rid="A02"/>
</contrib>
</contrib-group>
<aff id="A01">
<institution><![CDATA[,Central Electrochemical Research Institute  ]]></institution>
<addr-line><![CDATA[Karaikudi TN]]></addr-line>
<country>India</country>
</aff>
<aff id="A02">
<institution><![CDATA[,A.C. College of Engineering & Technology  ]]></institution>
<addr-line><![CDATA[Karaikudi TN]]></addr-line>
<country>India</country>
</aff>
<pub-date pub-type="pub">
<day>00</day>
<month>00</month>
<year>2009</year>
</pub-date>
<pub-date pub-type="epub">
<day>00</day>
<month>00</month>
<year>2009</year>
</pub-date>
<volume>27</volume>
<numero>6</numero>
<fpage>725</fpage>
<lpage>735</lpage>
<copyright-statement/>
<copyright-year/>
<self-uri xlink:href="http://scielo.pt/scielo.php?script=sci_arttext&amp;pid=S0872-19042009000600008&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://scielo.pt/scielo.php?script=sci_abstract&amp;pid=S0872-19042009000600008&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://scielo.pt/scielo.php?script=sci_pdf&amp;pid=S0872-19042009000600008&amp;lng=en&amp;nrm=iso"></self-uri><abstract abstract-type="short" xml:lang="en"><p><![CDATA[Influence of various carrier additives and brightener additives on the voltammetric behavior of zinc electro deposition from an alkaline non-cyanide bath was studied. Two different cathodic peaks were observed. Peak I has been attributed to hydrogen reduction / UPD of zinc and peak II to reduction of the metal. The extent of polarization of the zinc deposition to more negative potentials and the corresponding peak current decide the nature of deposits. PVA was found to be the best carrier additive. PVA chains retain zinc hydroxyl anions and control the speed of the rate determining step. Unsaturated aldehydes bring about 3-dimensional nucleation and further increase the polarization when added with PVA.]]></p></abstract>
<kwd-group>
<kwd lng="en"><![CDATA[addition agents]]></kwd>
<kwd lng="en"><![CDATA[alkaline non-cyanide bath]]></kwd>
<kwd lng="en"><![CDATA[bright zinc plating]]></kwd>
<kwd lng="en"><![CDATA[cyclic voltammetry]]></kwd>
<kwd lng="en"><![CDATA[potential scan range]]></kwd>
</kwd-group>
</article-meta>
</front><body><![CDATA[ <p align="center"><B>Voltammetric Studies on the Role of Additives in Bright Zinc    Electrodeposition from an Alkaline Non-Cyanide Bath</B></P>     <P align="center"><B>&nbsp;</B></P>     <P align="center"><B>S. Shanmugasigamani</B>,<I><SUP>1</SUP></I><B> </B><B>M.    Pushpavanam</B><I><SUP>2,</SUP></I><SUP><a href="#0">*</a><a name="top0"></a></SUP></B></P>     <P align="center"><B>&nbsp;</B></P>     <P align="center"><I><SUP>1 </SUP></I><I>Central Electrochemical Research Institute,    Karaikudi 630 006, TN, India</I></P>     <P align="center"><I><SUP>2 </SUP></I><I>A.C.</I><I> College</I><I> of Engineering    &amp; Technology, Karaikudi-630 004, TN, India</I></P>     <P align="center" >&nbsp;</P>     <P align="center">Received 3 July 2009; accepted 26 October 2009</P>     <P>&nbsp;</P>     <P><B>Abstract</B></P>     ]]></body>
<body><![CDATA[<P >Influence of various carrier additives and brightener additives on the voltammetric    behavior of zinc electro deposition from an alkaline non-cyanide bath was studied.    Two different cathodic peaks were observed.&nbsp; Peak I has been attributed    to hydrogen reduction / UPD of zinc and peak II to reduction of the metal. The    extent of polarization of the zinc deposition to more negative potentials and    the corresponding peak current decide the nature of deposits. PVA was found    to be the best carrier additive. PVA chains retain zinc hydroxyl anions and    control the speed of the rate determining step. Unsaturated aldehydes bring    about 3-dimensional nucleation and further increase the polarization when added    with PVA.</P> <Pl><B><I>Keywords</I></B><I>:</I> addition agents, alkaline non-cyanide bath,  bright zinc plating, cyclic voltammetry, potential scan range.</P>      <P>&nbsp;</P>     <P>Full text only in PDF format</P>     <P >Texto disponível em  PDF</P>     <P>&nbsp;</P>     <P><B>References</B></P>     <P >1. &nbsp;&nbsp;&nbsp;&nbsp; H. Geduld, Zinc  Plating, ASM International Metals Park, Ohio, 1988</P>     <P >2. &nbsp;&nbsp;&nbsp;&nbsp; M. Schlesinger and M.  Paunovic, Modern Electroplating, 4<SUP>th</SUP> Edn, John Wiley &amp; Sons, New  York 2000.&nbsp;&nbsp;&nbsp;&nbsp;  </P>     <!-- ref --><P >3. &nbsp;&nbsp;&nbsp;&nbsp; S. Shanmugasigamani, M.  Pushpavanam, J. Appl. Electrochem. 36 (2006) 315.&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=000021&pid=S0872-1904200900060000800001&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --><P >4. &nbsp;&nbsp;&nbsp;&nbsp; L. Oniciu, L. Muresan,  J. Appl. Electrochem. 21 (1991) 565.</P>     ]]></body>
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<body><![CDATA[<P>25.  &nbsp;&nbsp; T.C. Hsieh, C.C. Hu, T.C.  Lee, Surf. Coat. Technol. 203 (2009) 3111.</P>     <P>26.  &nbsp;&nbsp; X. Xiao, X. Yi, P. Zhong, Y.  Ou, Corr. Sci. Prot. Technol. 20 (2008) 62.</P>     <P>27. &nbsp;&nbsp; H.B. Muralidhara, Y.A. Naik, H.P. Sachin, G. Achary, T.V.    Venkatesha, Ind. J. Chem. Technol. 15 (2008) 259.</P>     <P>&nbsp;</P>      <P><SUP><a name="0"></a><a href="#top0">*</a></SUP> Corresponding author. E-mail address: <a href="MAILTO:malathypush@yahoo.com">malathypush@yahoo.com</a>  </P>      ]]></body><back>
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<nlm-citation citation-type="journal">
<person-group person-group-type="author">
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</article>
