<?xml version="1.0" encoding="ISO-8859-1"?><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<front>
<journal-meta>
<journal-id>0872-1904</journal-id>
<journal-title><![CDATA[Portugaliae Electrochimica Acta]]></journal-title>
<abbrev-journal-title><![CDATA[Port. Electrochim. Acta]]></abbrev-journal-title>
<issn>0872-1904</issn>
<publisher>
<publisher-name><![CDATA[Sociedade Portuguesa de Electroquímica]]></publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id>S0872-19042010000200003</article-id>
<title-group>
<article-title xml:lang="en"><![CDATA[Inhibition of Uniform and Pitting Corrosion Processes of Al Induced by SCN- anions - Part I. Effect of Glycine]]></article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Amin]]></surname>
<given-names><![CDATA[Mohammed A.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Mohsen]]></surname>
<given-names><![CDATA[Q.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Mersal]]></surname>
<given-names><![CDATA[Gaber A.M.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
</contrib-group>
<aff id="A01">
<institution><![CDATA[,Taif University Faculty of Science Chemistry Department]]></institution>
<addr-line><![CDATA[ ]]></addr-line>
</aff>
<pub-date pub-type="pub">
<day>00</day>
<month>00</month>
<year>2010</year>
</pub-date>
<pub-date pub-type="epub">
<day>00</day>
<month>00</month>
<year>2010</year>
</pub-date>
<volume>28</volume>
<numero>2</numero>
<fpage>95</fpage>
<lpage>112</lpage>
<copyright-statement/>
<copyright-year/>
<self-uri xlink:href="http://scielo.pt/scielo.php?script=sci_arttext&amp;pid=S0872-19042010000200003&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://scielo.pt/scielo.php?script=sci_abstract&amp;pid=S0872-19042010000200003&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://scielo.pt/scielo.php?script=sci_pdf&amp;pid=S0872-19042010000200003&amp;lng=en&amp;nrm=iso"></self-uri><abstract abstract-type="short" xml:lang="en"><p><![CDATA[As a first step towards inhibition of uniform and pitting corrosion processes of Al in SCN- solutions, glycine (Gly) was used. Full immersion tests, using inductively coupled plasma atomic emission spectroscopy (ICP-AES) method of chemical analysis were used to monitor rates of corrosion. The results obtained from the ICP method have been verified by electrochemical assays based on linear and cyclic polarization measurements. Monitoring the open circuit potential (OCP) of the system as a function of immersion time and Gly concentration was also carried out. SEM and EDX examinations of the electrode surface revealed the adsorption of Gly molecule on the surface. Results showed that the presence of Gly in aggressive SCN- solutions decreased the corrosion and passive currents and shifted the pitting potential to more noble values. Thus Gly inhibited uniform and pitting corrosion processes. The inhibition efficiency of Gly enhanced with its concentration. The potential of zero charge (PZC) of the Al electrode has been studied in 0.04 M KSCN solutions without and with Gly and the mechanism of adsorption is discussed. The adsorption of Gly precluded significant adsorption of the aggressive SCN- anions, and hence the corrosion rate was diminished.]]></p></abstract>
<kwd-group>
<kwd lng="en"><![CDATA[aluminum]]></kwd>
<kwd lng="en"><![CDATA[uniform corrosion]]></kwd>
<kwd lng="en"><![CDATA[pitting corrosion]]></kwd>
<kwd lng="en"><![CDATA[corrosion inhibition]]></kwd>
<kwd lng="en"><![CDATA[SCN- anions]]></kwd>
<kwd lng="en"><![CDATA[glycine]]></kwd>
</kwd-group>
</article-meta>
</front><body><![CDATA[ <P ><B>Inhibition of Uniform and Pitting Corrosion Processes of Al Induced by    SCN<SUP>-</SUP> anions - Part I. Effect of Glycine</B></P>     <P ><B  >&nbsp;</B></P>     <P ><B>Mohammed A. Amin<a name="topc1"></a><a href="#c1">*</a>, Q. Mohsen,    Gaber A.M. Mersal</B></P>     <P >&nbsp;</P>     <P >Materials and Corrosion Lab, Faculty of Science, Chemistry Department, Taif    University, 888 Hawiya, KSA</P>     <P >&nbsp;</P>     <P >DOI: 10.4152/pea.201002095</P>     <P >&nbsp;</P>     <P ><B  >Abstract</B></P>     <P >As a first step towards inhibition of uniform and pitting corrosion processes    of Al in SCN<SUP>-</SUP> solutions, glycine (Gly) was used. Full immersion tests,    using inductively coupled plasma atomic emission spectroscopy (ICP-AES) method    of chemical analysis were used to monitor rates of corrosion. The results obtained    from the ICP method have been verified by electrochemical assays based on linear    and cyclic polarization measurements. Monitoring the open circuit potential    (OCP) of the system as a function of immersion time and Gly concentration was    also carried out. SEM and EDX examinations of the electrode surface revealed    the adsorption of Gly molecule on the surface. Results showed that the presence    of Gly in aggressive SCN<SUP>-</SUP> solutions decreased the corrosion and passive    currents and shifted the pitting potential to more noble values. Thus Gly inhibited    uniform and pitting corrosion processes. The inhibition efficiency of Gly enhanced    with its concentration.&nbsp; The potential of zero charge (PZC) of the Al electrode    has been studied in 0.04 M KSCN solutions without and with Gly and the mechanism    of adsorption is discussed. The adsorption of Gly precluded significant adsorption    of the aggressive SCN<SUP>-</SUP> anions, and hence the corrosion rate was diminished.</P>     ]]></body>
<body><![CDATA[<p><B>Keywords</B>: aluminum, uniform    corrosion; pitting corrosion; corrosion inhibition; SCN<SUP>-</SUP> anions;    glycine.</P>     <P >&nbsp;</P>     <P ><B>Introduction</B></P>     <P >Aluminum is an important material for use in many applications, such as for    automobiles, aviation, household appliances, containers, and electronic devices    <a name="top1"></a><sup><a href="#1">[1-3]</a></sup>, owing to its many favorable    characteristics, including its good electrical and thermal conductivities, low    density, high ductility, and good corrosion resistance.</P>     <P >The resistance of aluminum against corrosion in aqueous media can be attributed    to a rapidly formed surface oxide film. However, the presence of aggressive    ions like chloride creates extensive localized attack. Our previous studies    <sup><a name="top4"></a><a href="#4">[4-8]</a></sup> have shown that aluminum    and some of its alloys also suffer from localized corrosion due to the aggressive    attack of ClO<SUB>4</SUB><SUP>-</SUP> and SCN<SUP>-</SUP> anions.</P>     <P >Generally, localized corrosion can be prevented by the action of adsorptive    inhibitors which prevent the adsorption of the aggressive anions or by the formation    of a more resistant oxide film on the metal surface <a name="top9"></a><sup><a href="#9">[9]</a></sup>.    Chromates are recognized as being very efficient to inhibit the corrosion of    aluminum and aluminum alloys. The action is linked, firstly to the formation    of an insoluble chromium oxide Cr<SUB>2</SUB>O<SUB>3</SUB>, which strengthens    the alumina layer, and secondly to the incorporation of chromate ions in the    alumina film, which prevent pitting corrosion through their ability to repair    defects in the oxide film <sup><a name="top6"></a><a href="#6">[6</a></sup>,<sup><a name="top10"></a><a href="#10">10-14]</a></sup>.  </P>     <P >Literature survey showed that a number of organic compounds were described    as aluminum corrosion inhibitors in a variety of media <sup><a name="top15"></a><a href="#15">[15-21]</a></sup>.    Other organic compounds were used in our lab as inhibitors for corrosion of    aluminum and some of its alloys in acidic, neutral and weakly alkaline solutions    <sup><a name="top22"></a><a href="#22">[22-29]</a></sup>. The majority of these    organic inhibitors are toxic. The toxicity of these organic compounds and chromates    has led to interest in the use of more environmentally acceptable treatment.    Amino acids are biodegradable and might accommodate at least some of the environmental    restrictions. </P>     <P >The present work reports on the results obtained in the study of glycine (Gly)    as a safe-inhibitor for Al corrosion processes (uniform and pitting) in KSCN    solutions at 25 <SUP>o</SUP>C. For this purpose, chemical (ICP-AES) and electrochemical    (linear and cyclic polarization) methods were used, complemented with SEM and    EDX examinations of the electrode surface. We are considering this work as a    starting point to protect Al against corrosion in the aggressive SCN<SUP>-</SUP>    solutions. Glycine, the simplest amino acid, will be studied first. A new glycine    derivative was synthesized in our lab and will be described and fully discussed    in a further complementary paper.</P>     <P >&nbsp;</P>     <P ><B>Experimental </B></P>     ]]></body>
<body><![CDATA[<P >The working electrode employed here was made of pure Al (99.98%) provided    by the Egyptian Aluminum Company (EAC). The Al electrode was used in the as-received    condition. The investigated electrode was cut as a cylindrical rod, welded with    Cu-wire for electrical connection and mounted into glass tubes of appropriate    diameter using Araldite to offer an active flat disc shaped surface of (0.50    cm<SUP>2</SUP>) geometric area for the working electrode, to contact the test    solution. Prior to each experiment, the electrode surface was wet polished with    silicon carbide from 220 to 500 grits, degreased with acetone and, finally,    rinsed with distilled water.</P>     <P >All experiments (either chemical or electrochemical) were carried out in 0.04    M KSCN solutions without and with various concentrations (10<SUP>-5</SUP> &#8211;    5´10<SUP>-3</SUP> M) of Gly. All solutions were freshly prepared from analytical    grade chemical reagents using doubly distilled water and were used without further    purification. For each run, a freshly prepared solution as well as a cleaned    set of electrodes was used. Each run was carried out in aerated stagnant solutions    at the required temperature (±1 ºC), using a water thermostat.</P>     <P >Full immersion tests were performed in accordance with the ASTM-G31 standard    <sup><a name="top30"></a><a href="#30">[30]</a></sup>. Exposure times between    1.0 and 30 days were used. Corrosion rates were monitored in 0.04 M KSCN solutions    without and with various concentrations of Gly as a function of the immersion    time (1-30 days) at 25 ± 1 <SUP>o</SUP>C using inductively coupled plasma atomic    emission spectroscopy (ICP-AES) method of chemical analysis. After these immersion    essays, micro-structural features of some of the exposed samples were analyzed    by EDX and SEM examinations using a Jeol-Jem-1200 EX II electron microscope    equipped with a Traktor TN-2000 energy dispersive spectrometer.</P>     <P >In the ICP method, the Al<SUP>3+</SUP> ions concentration was determined using    Perkin-Elmer Optima 2100 Dual View inductively coupled plasma atomic emission    spectrometry (ICP-AES) instrument connected with AS 93 Plus autosampler. The    40-MHz free-running generator was operated at a forward power of 1.3 kW; the    outer, intermediate and Ar carrier gas flow rates were 15.0, 0.2 and 0.8 L/min,    respectively. The carrier gas flow rate was optimized to obtain maximum signal-to-background    ratios. In all experiments, the measured samples were nebulized downstream to    the plasma by the autosampler and the concentrations were automatically determined    using the standard calibration graph. The system adjusted to measure the samples    in triplicates and the relative standard deviation was calculated. The RSD was    &lt; 2 % and the correlation coefficient was &gt; 0.99998.</P>     <P >Electrochemical experiments were performed in a 100 mL volume Pyrex glass    cell using Pt wire and a saturated calomel electrode (SCE) as auxiliary and    reference electrodes, respectively. The SCE was connected via a Luggin capillary,    the tip of which was very close to the surface of the working electrode to minimize    the IR drop. All potentials given in this paper are referred to this reference    electrode. </P>     <P >Electrochemical measurements were performed using Autolab frequency response    analyzer (FRA) coupled to an Autolab Potentiostat/Galvanostat (PGSTAT30) with    FRA2 module connected to a personal computer.</P>     <P >Linear polarization technique has been used to evaluate the degree of protection    against uniform corrosion processes supplied by Gly, as well as to obtain information    about the mechanism of the inhibition process. </P>     <P >On the other hand, pitting corrosion inhibition degree has been evaluated    in terms of both nucleation of pits and growth of pre-existing pits, using cyclic    polarization technique. Measurements were carried out by sweeping linearly the    potential from the starting potential, -2000 mV (SCE), into the positive direction,    at a scan rate of 0.50 mV s<SUP>-1</SUP> up to the end potential,+2000    mV (SCE),(linear polarization) and then reversed with the same scan    rate till forming a well-defined hysteresis loop (cyclic polarization). The    stabilization period prior to collecting data was 12 h. The open circuit potential    of the working electrode was measured as a function of time during this stabilization    time. This time was quite sufficient to reach a quasi-stationary value for the    open circuit potential. </P>     <P >Complex-plane impedance plots were also recorded for Al in 0.04 M KSCN solutions    without and with 5x10<SUP>-3</SUP> M Gly as a function of potential, and a plot    of capacitance vs. potential plot was constructed. The aim is to study the potential    of zero charge (PZC) of Al in these solutions in order to gain more information    regarding the electrostatic adsorption of Gly. Impedance measurements were carried    out using AC signals of amplitude 5.0 mV peak to peak at the open circuit potential    in the frequency range 100 kHz&#8211;1.0 mHz. Capacitance values were evaluated    based on the equivalent circuit presented in our previous study <sup><a name="top8"></a><a href="#8">[8]</a></sup>.</P>     <P >Other Al samples were exposed to severe pitting attack; the samples were immersed    for 20 min in 0.04 M KSCN solutions without and with 5x10<SUP>-3</SUP> M Gly    at 25 ºC. Measurements were performed under potentiostatic regime at 1400 mV    (anodic to the pitting potential, E<SUB>pit</SUB>, recorded for Al in 0.04 M    KSCN), and finally washed thoroughly and submitted for 20 min to ultrasonic    cleaning in order to remove loosely adsorbed ions. The morphology of the passive    layer and the corrosion products formed on the electrode surface were again    examined by EDX and SEM examinations.</P>     ]]></body>
<body><![CDATA[<P >&nbsp;</P>     <P ><B>Results and discussion</B></P>     <P ><B><I >Chemical studies</I></B></P>     <P ><I  >ICP-AES measurements</I></P>     <P >The open-circuit free corrosion rate was determined separately, using ICP-AES    technique, by determination of dissolved Al<SUP>3+</SUP> ions in aerated 0.04    M KSCN solutions without and with various concentrations (10<SUP>-5</SUP> &#8211;    5x10<SUP>-3</SUP> M) of Gly at 25 <SUP>o</SUP>C. In the course of ICP experiments,    localized corrosion is not supposed to be formed. Otherwise, the results cannot    be compared with those obtained from the linear polarization technique (see    later). This is because linear polarization measures only the uniform corrosion    rate, particularly when it is performed at potentials around the corrosion potential    (E<SUB>corr</SUB>), i.e., within the potential range of Tafel region. Indeed,    after 30 days of immersion, no pits were observed under the optical microscope    (100 ´ magnification). Thus, extensive pitting attack does not exist. The absence    of pitting attack under these conditions was further confirmed here, as will    be seen, using SEM. </P>     <P >In the ICP experiments, known aliquots of the solution containing dissolved    Al<SUP>3+</SUP> ions were withdrawn as a function of time and Gly concentration    and were analyzed to produce the corrosion-time curves depicted in Fig. 1. The    slope of each line (mass, in mg, of Al dissolved as Al<SUP>3+</SUP> per unit    area per unit time; mg cm<SUP>&#8722;2</SUP> h<SUP>&#8722;1</SUP>) represents    the corrosion rate of Al at the specified conditions. The numerical values of    these slopes were converted into the corresponding corrosion current density    values using Faraday<SUP>,</SUP>s law, and subsequently converted into corrosion    rates, &#965;<SUB>ICP-AES</SUB>, in &#956;m y<SUP>-1</SUP> (Micrometer per year;    the penetration rate of corrosion through a metal) using the expression <a name="top31"></a><sup><a href="#31">[31]</a></sup>:</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03e1.jpg" width="499" height="26"></P>     
<P >where M is the atomic weight of Al (26.98154 g), n the number of electrons    transferred in the corrosion reaction (n = 3) and d the density of Al (2.70    g cm<SUP>-3</SUP>). </P>     <P >&nbsp;</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f1.jpg" width="341" height="256"></P>     
]]></body>
<body><![CDATA[<P ><B>Figure 1.</B> Corrosion-time plots recorded for Al in aerated 0.04 M KSCN    solutions without and with various concentrations (10<SUP>-5</SUP> &#8211; 5´10<SUP>-3</SUP>    M) of Gly at 25 <SUP>o</SUP>C. (1) blank; (2) 10<SUP>-5</SUP> M Gly; (3) 5´10<SUP>-5</SUP>    M Gly; (4) 10<SUP>-4</SUP> M Gly; (5) 5´10<SUP>-4</SUP> M Gly; (6) 10<SUP>-3</SUP>    M Gly; (7) 5´10<SUP>-3</SUP> M Gly. </P>     <P >&nbsp;</P>     <P >As the corrosion rate depends directly on mass of Al dissolved, the addition    of Gly results in a decrease in this parameter. This is clearly seen from the    decrease of the mass of dissolved Al with Gly concentration. These findings    indicate that Gly can be considered as inhibitor of Al uniform corrosion in    KSCN solutions.</P>     <P >The corrosion currents obtained from the ICP method were also used to evaluate    inhibition efficiency values, <I>I</I><SUB>ICP-AES</SUB>(%), as a function of    Gly concentration, using the well-known expression:</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03e2.jpg" width="504" height="26">  </P>     
<P >where <I>j<SUP>o</SUP><SUB>corr</SUB></I> and <I>j<SUB>corr</SUB></I> are    the corrosion current densities for uninhibited and inhibited solutions, respectively.    Fig. 2 shows the corrosion rates (&#965;<SUB>ICP-AES</SUB>) and inhibition efficiencies    (<I>I</I><SUB>ICP-AES</SUB> (%)) as a function of Gly concentration at 25 <SUP>o</SUP>C.    It follows from Fig. 2 that the corrosion rate is suppressed, and therefore    the corrosion inhibition strengthened, with increase in Gly concentration. This    trend may result from, as will be shown soon, the fact that adsorption and surface    coverage increases with the increase in inhibitor concentration; thus the surface    is separated from the medium <sup><a name="top32"></a><a href="#32">[32]</a></sup>.    <a name="topf2"></a></P>     <P >&nbsp;</P>     <P ><b><img src="/img/revistas/pea/v28n2/28n2a03f2.jpg" width="385" height="258"></b></P>     
<P ><B><a href="#f2">Figure 2</a>. </B>Corrosion rates (&#965;<SUB>ICP-AES</SUB>)    against inhibition efficiencies (<I>I</I><SUB>ICP-AES</SUB> (%)), obtained from    ICP-AES method of chemical analysis, for Al in aerated 0.04 M KSCN solutions    without and with various concentrations (10<SUP>-5</SUP> &#8211; 5´10<SUP>-3</SUP>    M) of Gly at 25 <SUP>o</SUP>C. </P>     <P >&nbsp;</P>     ]]></body>
<body><![CDATA[<P >A surface film of Gly is assumed to be formed, protecting Al against uniform    corrosion in SCN<SUP>-</SUP> solutions. This was confirmed from surface analysis    (SEM and EDX examinations) performed for the corroded and inhibited Al samples,    see Figs. 3 and 4. Regarding to the SEM images presented in Fig. 3, the mechanically    polished Al electrode without any treatment (clean sample, image a) shows that    the Al sample immersed in 0.04 M KSCN solution has corrosion areas on its polished    surface (see image b) which do not exist on the clean sample. The appearance    of such corroded areas may be attributed to the dissolution of alumina layer    due to the aggressive attack of SCN<SUP>-</SUP> anions and the increased alkalinity    of the solution in the vicinity of the electrode surface (see more details in    section 3.2.2). </P>     <P >&nbsp;</P>     <P ><b><a name="topf3"></a></b></P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f3.jpg" width="353" height="296"></P>     
<P ><B><a href="#f3">Figure 3</a>. </B>SEM images obtained for <B>(a)</B> polished    Al, and for Al, after a full immersion test of 30 days at 25 <SUP>o</SUP>C,    in aerated 0.04 M KSCN solution without (image b) and with 5x10<SUP>-4</SUP>    M Gly (image c), or with 5x10<SUP>-3</SUP> M Gly (image d) at 25 <SUP>o</SUP>C.    <a name="topf4"></a></P>     <P   >&nbsp;</P>     <P > <B><img src="/img/revistas/pea/v28n2/28n2a03f4.jpg" width="578" height="463"></B></P>     
<P ><B><a href="#f4">Figure 4</a>. </B>EDX spectra recorded for Al, after a full    immersion test of 30 days at 25 <SUP>o</SUP>C, in aerated 0.04 M KSCN solution    <B>(a)</B> without and <B>(b)</B> with 5´10<SUP>-4</SUP> M Gly, <B>(c)</B> 10<SUP>-3</SUP>    M Gly<B>, </B>or <B>(d)</B> 5´10<SUP>-3</SUP> M Gly at 25 <SUP>o</SUP>C. </P>     <P >&nbsp;</P>     <P >On the other hand, in presence of Gly, there is an improvement in the surface    morphology due to the obvious decrease in the corroded areas caused by the Gly    layer covering the active sites. This improvement in the surface morphology    enhances with Gly concentration (images c-d). Therefore, it can be concluded    that on the Al surface, after a full immersion test of 30 days in aerated 0.04    M KSCN solutions containing various concentrations of Gly, a protective film    of the inhibitor is developed, and the protectiveness of such film depends on    Gly concentration. </P>     ]]></body>
<body><![CDATA[<P >On the other hand, the EDX spectra of Fig. 4 contain peaks characteristic    of C, N and S in the passive Al<SUB>2</SUB>O<SUB>3</SUB> film (characterized    by Al and O signals). The presence of C, N and S signals reflects the adsorption    and incorporation of the aggressive SCN<SUP>-</SUP> anions onto the passive    oxide film <sup><a href="#8">[8]</a></sup>. In presence of Gly, the contribution    of signals of C, N and O obviously enhances, as a function of Gly concentration    (see Figs. 4b-d), at the expense of the S signal compared with their contribution    in bare KSCN solution (Fig. 4a). </P>     <P >Thus, considering the EDX analysis, it can be concluded that the main action    of Gly is to impede the adsorption of SCN<SUP>-</SUP> anions and the dissolution    of the oxide film to an extent depending on Gly concentration. As a consequence,    the alumina layer is protected against corrosion. </P>     <P >All previous results reveal that the corrosion inhibition effect of Gly is    due to its adsorption onto the aluminum surface blocking the corrosion process.    Two types of mechanisms of inhibitor adsorption may be considered. The first    is physical (electrostatic) adsorption, the most probable one, and the second    may be chemical adsorption assisted by hydrogen bond formation between inhibitor    and the oxidized electrode surface (see more details in section 4). </P>     <P >&nbsp;</P>     <P ><B><I >Electrochemical measurements</I></B></P>     <P ><I>OCP vs. time curves</I></P>     <P >As mentoned in the experimental part, special care was taken in the stability    of the OCP before each polarization run. Moreover, measuring the variation with    time of the OCP of the working electrode is important in defining domains of    corrosion, partial and complete inhibition, and in determining inhibitor-threshold    concentrations <sup><a name="top33"></a><a href="#33">[33]</a></sup>. Fig. 5    illustrates the evolution of the open circuit potential (OCP) with immersion    time of Al in an aerated solution of 0.04 M KSCN in the absence or in the presence    of various concentrations of Gly at 25 <SUP>o</SUP>C. </P>     <P ><b><a name="topf5"></a></b> </P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f5.jpg" width="321" height="545"></P>     
<P ><B><a href="#f5">Figure 5</a>. </B>Open circuit potential vs. time plots recorded    for Al in aerated 0.04 M KSCN solutions without and with various concentrations    of Gly at 25 <SUP>o</SUP>C. </P>     ]]></body>
<body><![CDATA[<P >&nbsp;</P>     <P >In the absence of Gly (curve 1), it can be seen, in first moments of the period    of immersion, how the corrosion potential moves rapidly towards less negative    values due to the formation of the oxide layer. Then, the electrode potential    shifts rapidly towards the more negative values during the first 20 min of immersion.    This evolution may be attributed to the adsorption of SCN<SUP>-</SUP> anions,    confirmed from EDX examinations of the electrode surface at the open circuit    potential (see Fig. 4a). For increasing immersion times, the open circuit potential    goes towards a more positive value and keeps a constant value (steady potential)    after about 90 min of immersion due to the formation of a porous layer of alumina    <sup><a name="top34"></a><a href="#34">[34]</a></sup>. This steady potential    corresponds to the free corrosion potential, <I>E</I><SUB>corr</SUB>, confirmed    from polarization studies (section 3.2.2) of the metal; similar results were    previously obtained<a name="top35"></a> <sup><a href="#35">[35]</a></sup>.</P>     <P >Bockris <sup><a href="#34">[34]</a></sup> has shown that the passive layers    on aluminium involve a porous pre-layer of Al(OH)<SUB>3</SUB> and Al<SUB>2</SUB>O<SUB>3</SUB>.    Part of the Al<SUB>2</SUB>O<SUB>3</SUB> is AlO(OH), in fibril form. Destruction    of the passive layer involves penetration of these fibrils by Cl<SUP>-</SUP>,    which displaces the passivating species and diffuses out in the form of an AlCl<SUB>n</SUB><SUP>m+</SUP>    complex. In agreement with <sup><a href="#34">[34]</a></sup> as well as our    previous study <sup><a href="#8">[8]</a></sup>, SCN<SUP>-</SUP> anions are expected    to behave like Cl<SUP>-</SUP>, with the subsequent formation of Al(SCN)<SUB>3</SUB>    soluble species. </P>     <P >On the other hand, upon introducing Gly, new curve features were recorded,    depending on Gly concentration. Addition of dilute concentrations of Gly (curves    2-5 in <a name="f3"></a><a href="#topf3">Fig. 3a</a>) or GlyD (curves 2 and    3 in <a name="f4"></a><a href="#topf4">Fig. 4a</a>), for the first moment of    immersion, shifts significantly the electrode potential to more negative values    in comparison with the solution without inhibitor (curve 1). The magnitude of    this negative shift of potential depends on the concentration of the tested    inhibitor. At the same time, the growth of the oxide film is slowed down due    to the decrease in the slope of the initial linear part of <I>E</I> vs. <I>t</I>    plots. In addition, the steady state <I>E<SUB>corr</SUB></I> drifts to more    negative values without changing the general shape of the OCP vs. time plots.    This negative shift in <I>E<SUB>corr</SUB></I> enhances with increase in Gly    concentration.&nbsp; </P>     <P >For concentrations of Gly higher than 7.5´10<SUP>-5</SUP> M (Fig. 5b, curves    6-10), the OCP shifted first to less negative values reaching a maximum. After    a certain time, depending on inhibitor concentration, the potential declined    to a reasonably steady value. This trend indicated the occurrence of two counter-acting    processes. The first process being the formation of a protective layer of the    inhibitor on the electrode surface, and consequently delayed-action corrosion    occurred shifting the OCP to nobler values. The second process is corrosion,    due to adsorption of the aggressive SCN<SUP>-</SUP> anions, which dragged the    potential back towards active values. This means that a competitive adsorption    exists between the inhibitor, as will be seen, and the aggressive SCN<SUP>-</SUP>    anions. </P>     <P >This competition may explain the appearance of an arrest in the corresponding    OCP vs. time curves. The time corresponding to the end of this arrest, see again    Fig. 5b, is designated here as <I>t<SUB>m</SUB></I>. It is obvious that the    parameter <I>t<SUB>m</SUB></I> is dependent upon the Gly concentration. Values    of t<SUB>m</SUB> are always longer in presence of increasing concentrations    of Gly. These findings, as a first sight, indicate that Gly inhibits, confirming    results of ICP, Al corrosion in SCN<SUP>-</SUP> solutions to an extent depending    on its concentration. Thus, surface coverage, and therefore inhibition performance    of Gly increases with increase in its concentrations. </P>     <P >However, the appearance of this arrest indicates that Gly under these conditions    is not able to ensure effective corrosion inhibition. The progressive negative    shift in E<SUB>corr</SUB> with increasing Gly concentration (inspect again Fig.    5) may be explained on the basis that Gly adsorbs preferentially on the electrode    surface, impeding the cathodic sites (see more details in section 3.2.2). At    C<SUB>Gly</SUB> &gt; 10<SUP>-3</SUP> M, see curves 11 and 12 in Fig. 5b, the    OCP shifted to less negative values, reaching a reasonably steady value. These    findings may also reflect the ability of Gly to inhibit the anodic process too.  </P>     <P >&nbsp;</P>     <P ><I>Polarization measurements</I></P>     <P ><U>Inhibition of uniform corrosion&nbsp; </U></P>     ]]></body>
<body><![CDATA[<P >Fig. 6 shows the cathodic and anodic polarization plots recorded for Al in    0.04 M KSCN solution without and with various concentrations of Gly at a scan    rate of 0.5 mV s<SUP>-1</SUP> at 25 <SUP>o</SUP>C. Regarding to region I, the    increase in Gly concentration reduced both the anodic and cathodic current densities    and shifted the corrosion potentials (<I >E</I><SUB>corr</SUB>) to more negative    values. These results indicate that Gly possesses a stronger influence on retarding    the electrochemical processes occurring on the cathodic sites of Al surface,    more than on the anodic sites (dissolution of Al). This means that Gly may be    classified as a mixed-type inhibitor that acts predominately on the cathodic    sites. </P>     <P >The anodic process that takes place on the electrode surface is Al dissolution    as a result of the reaction presented in Eq. 3:</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03e3.jpg" width="385" height="25"></P>     
<P >&nbsp;</P>     <P ><a name="topf6"></a></P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f6.jpg" width="320" height="254"></P>     
<P ><B><a href="#f6">Figure 6</a>. </B>Cyclic polarization curves recorded for    Al in aerated 0.04 M KSCN solutions without and with various concentrations    (10<SUP>-5</SUP> &#8211; 10<SUP>-3</SUP> M) of Gly at a scan rate of 0.5 mV    s<SUP>-1</SUP> at 25 <SUP>o</SUP>C. (1) blank; (2) 10<SUP>-5</SUP> M Gly; (3)    5´10<SUP>-5</SUP> M Gly; (4) 10<SUP>-4</SUP> M Gly; (5) 5´10<SUP>-4</SUP> M    Gly; (6) 10<SUP>-3</SUP> M Gly; (7) 5´10<SUP>-3</SUP> M Gly. </P>     <P >&nbsp;</P>     <P >The associated cathodic response is that of reduction of dissolved O<SUB>2</SUB>    and/or H<SUB>2</SUB>O, as indicated in reactions (4) and (5):</P>     <P><img src="/img/revistas/pea/v28n2/28n2a03e4.jpg" width="462" height="67"></P>     
]]></body>
<body><![CDATA[<P >As a result of these reactions, the local pH becomes more alkaline; hence    the layer of aluminum oxide is dissolved according to the reaction:</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03e6.jpg" width="458" height="27"></P>     
<P >In parallel, Al oxidation by uniform corrosion may occur, and a layer of aluminum    oxide is formed, with the physical detachment of gaseous hydrogen, according    to reaction (7):</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03e7.jpg" width="459" height="22"></P>     
<P >Extrapolation of Tafel lines is one of the most popular DC techniques for    estimation of corrosion rate. Polarization plots presented in <a name="f6"></a><a href="#topf6">Fig.    6</a> (region I) allow us to estimate the corrosion current density (j<SUB>corr</SUB>)    from Tafel extrapolation of the cathodic curves to E<SUB>corr</SUB>. All the    recorded <I>j<SUB>corr</SUB></I> values were introduced in Eqs. 1 and 2 to obtain    the corrosion rate, &#965;<SUB>Tafel</SUB>, and inhibition efficiency, <I>I</I><SUB>Tafel</SUB>(%),    values, as a function of Gly concentration (Fig. 7). A decrease in the corrosion    rate, corresponding to an increase in the inhibition efficiency, can be clearly    noticed. These results parallel those recorded in <a name="f2"></a><a href="#topf2">Fig.    2</a> coming from the ICP method of chemical analysis. </P>     <P >&nbsp;</P>     <P ><b><a name="topf7"></a></b></P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f7.jpg" width="384" height="259"></P>     
<P ><B><a href="#f7">Figure 7</a>. </B>Corrosion rates (&#965;<SUB>Tafel</SUB>)    against inhibition efficiencies (<I>I</I><SUB>Tafel</SUB> (%), obtained from    polarization measurements, for Al in aerated 0.04 M KSCN solutions without and    with various concentrations (10<SUP>-5</SUP> &#8211; 5´10<SUP>-3</SUP> M) of    Gly at 25 <SUP>o</SUP>C. </P>     <P >&nbsp;</P>     ]]></body>
<body><![CDATA[<P ><U>Inhibition of pitting corrosion&nbsp; </U></P>     <P >It was also the purpose of the present work to determine the inhibition power    of Gly against pitting corrosion of Al in the aggressive SCN<SUP>-</SUP> solutions.    To achieve this, the anodic behavior of Al regarding corrosion, passivation    and breakdown of passivity in these solutions was studied, move to region II    in <a href="#topf6">Fig. 6</a>.</P>     <P >It is obvious that Al pits in KSCN solutions exhibiting a well-defined hysteresis    loop, characteristic of passivation breakdown on the upward sweep and repassivation.    The existence of a hysteresis loop in a cyclic potentiodynamic polarization    curve indicates that repassivation of an existing pit is more difficult when    the potential is scanned toward the negative direction. </P>     <P >The larger the hysteresis loop, the more difficult the repassivation is. E<SUB>pit</SUB>    represents the potential limit above which the formation of pitting begins.    E<SUB>rp</SUB> refers to the limit below which the metal remains passive, and    it is defined as the potential where the forward and reverse scan cross; it    marks the division between stable and unstable passivity. Intermediate values    between E<SUB>pit</SUB> and E<SUB>rp</SUB> did not permit the formation of new    pits, but allowed the development of those which already existed. The narrower    the hysteresis loop the easier it becomes to repassivate the pit.</P>     <P >Based on the above argument, cyclic polarization technique is therefore useful    in determining the degree of protection against pitting corrosion provided by    Gly as well as its effect on the characteristics steps of this form of localized    attack, i.e., nucleation of new pits and growth of pre-existing pits. According    to <sup><a href="#9">[9]</a></sup>, two factors should contribute to the overall    pitting corrosion resistance. First, the resistance against the nucleation of    new pits and, secondly, a growth resistance of pre-existing pits. The former    has been evaluated as the difference, <I>R</I>, between the pitting potential,    <I>E</I><SUB>pit</SUB>, and the corrosion potential, <I>E</I><SUB>corr</SUB>.    Though this <I>R</I> parameter cannot be used in absolute terms, it is very    useful when used as a comparative parameter. Thus, a higher <I>R</I> value refers    to a higher resistance against pit nucleation. </P>     <P >The protection degree against pitting nucleation, designated here as <I>P</I><SUB>pit</SUB>,    was therefore estimated in terms of the percentage increase of parameter <I>R</I>.    The reference value of this parameter, i.e., <I>R</I><SUP>o</SUP>, was taken    in the cyclic polarization experiment carried out in bare KSCN solution. Fig.    8 shows the degree of protection against pitting nucleation, <I>P</I><SUB>pit</SUB>,    as a function of Gly concentration. Fig. 8 reveals that <I>P</I><SUB>pit</SUB>    increases with increase in Gly concentration.&nbsp; </P>     <P >&nbsp;</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f8.jpg" width="337" height="259"></P>     
<P ><B>Figure 8. </B>Estimated values of the degree of protection against pitting    nucleation, <I>P</I><SUB>pit</SUB>, as a function of Gly concentration at 25    <SUP>o</SUP>C. </P>     <P >&nbsp;</P>     ]]></body>
<body><![CDATA[<P >The resistance against growth of pre-existing pits was evaluated by comparing    the areas of the anodic hysteresis loops observed in the cyclic polarization    diagrams plotted in the j/E style, not included here. Using a specific routine    of the M352 Corrosion Software, the areas of the anodic hysteresis loops were    calculated. This area is related to the electrochemical charge consumed during    the growth of the pre-existing pits. The percentage decrease of this area, from    the value observed for the blank solution, was taken as a measure for the protection    degree against pitting growth. From these values the percentage decrease of    spent power, <I>P</I><SUB>g</SUB>, can be calculated (see Fig. 9).</P>     <P >&nbsp;</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f9.jpg" width="335" height="261"></P>     
<P ><B>Figure 9. </B>Degree of protection values, <I>P</I><SUB>g</SUB>(%), against    pit growth as a function of Gly concentration at 25 <SUP>o</SUP>C.</P>     <P >&nbsp;</P>     <P >The <I>P</I><SUB>g</SUB> parameter can be used as a measurement of the resistance    against pitting growth. From Figs. 8 and 9, addition of Gly to aggressive SCN<SUP>-</SUP>    solutions resulted in an improved behaviour against pitting corrosion of Al.    However, the protection efficiency against uniform and pitting corrosion processes    still unsatisfied, see <a name="f2"></a><a href="#topf2">Figs. 2</a> and <a name="topf12"></a><a href="#f12">12</a>,    and requires much improvement. This being one aspect that undoubtedly deserves    further study.</P>     <P >Surface analysis (Figs. 10 and 11) also revealed the adsorption and the subsequent    inhibition power of Gly against pitting corrosion of Al in aggressive SCN<SUP>-</SUP>    solutions. Surface morphologies presented in Fig. 10 revealed the occurrence    of intense pitting corrosion on the specimen exposed to this high anodic potential    (positive to <I>E</I><SUB>pit</SUB>). A large pit can be observed with an average    diameter close to 50 µm. This large pit was apparently composed of several smaller    pits and some pits were formed at the bottom of previous formed pits.</P>     <P ><b><a name="topf10"></a></b></P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f10.jpg" width="472" height="197"></P>     
<P ><B><a href="#f10">Figure 10</a>. </B>SEM images obtained for Al subjected    to severe pitting attack in aerated 0.04 M KSCN solutions without (image a)    and with (image b) 5´10<SUP>-3</SUP> M Gly. Severe pitting conditions (the sample    is potentiostatically held at 1300 mV, &gt; E<SUB>pit</SUB>, for 30 min) at    25 <SUP>o</SUP>C.</P>     ]]></body>
<body><![CDATA[<P >&nbsp;</P>     <P >&nbsp;</P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f11.jpg" width="599" height="209"></P>     
<P ><B>Figure 11. </B>EDX spectra obtained for Al subjected to severe pitting    attack, as described in <a name="f7"></a><a href="#topf7">Fig. 7</a>, in aerated    0.04 M KSCN solutions (a) without and (b) with 10<SUP>-3</SUP> M Gly at 25 <SUP>o</SUP>C.  </P>     <P >&nbsp;</P>     <P ><b><a name="topf12"></a></b></P>     <P ><img src="/img/revistas/pea/v28n2/28n2a03f12.jpg" width="330" height="263"></P>     
<P ><B><a href="#f12">Figure 12</a>. </B>The C<SUB>dl</SUB> vs. <I>E</I> plot    recorded for Al in 0.04 M KSCN solution (a) without and (b) with 5´10<SUP>-3</SUP>    M Gly.</P>     <P >&nbsp;</P>     <P >The radial growth of this large pit seems to begin by the coalescence of small    pits. It seems that the rate of radial growth of large pits as well as their    penetration rate is high and observable at this high applied anodic potential,    yielding intense pitting attack. In contrast to this, little pitting attack    is observed in the SEM image of the sample tested, under the same experimental    conditions, in Gly-SCN<SUP>-</SUP>-containing solutions, see <a name="f10"></a><a href="#topf10">Fig.    10</a>. </P>     ]]></body>
<body><![CDATA[<P >The EDX spectra depicted in Fig. 11, performed for the two samples that were    previously prepared for the SEM examinations (Fig. 10), gave exactly the same    trend of the EDX spectra presented in <a name="f4"></a><a href="#topf4">Fig.    4</a>. Just note the high contribution of C, N and S signals in Fig. 11 compared    with their contribution in <a href="#topf4">Fig. 4</a>. This was attributed,    as reported in our previous study <sup><a href="#8">[8]</a></sup>, to the applied    anodic potential effect. Here again, the adsorption and incorporation of Gly    was confirmed. These results suggest that Gly can also play an important role    as a pitting corrosion inhibitor.</P>     <P    >&nbsp;</P>     <P ><B  ><I  >Mechanism of inhibition</I></B></P>     <P >It is well-known that the phenomenon of adsorption is influenced by the nature    and surface charge of the metal and by the chemical structure of inhibitors.    Terminal oxygen atoms at metal oxide surfaces react with water, forming hydroxylated    sites that impart a pH-dependent surface charge. Surface charge depends on activities    of potential-determining ions (H<SUP>+</SUP> and OH<SUP>-</SUP>) and electrolyte    concentrations (ionic strength, I) <sup><a name="top36"></a><a href="#36">[36]</a></sup>.    The pH where the net total particle charge is zero is called the point of zero    charge (PZC). The point of zero charge is an important parameter characterizing    the adsorption properties of metal oxides and related materials <sup><a name="top37"></a><a href="#37">[37</a></sup>,<sup><a name="top38"></a><a href="#38">38]</a></sup>.  </P>     <P >The pH of the PZC for aluminum oxides/hydroxides is 9 <sup><a name="top39"></a><a href="#39">[39</a></sup>,<sup><a name="top40"></a><a href="#40">40]</a></sup>.    Depending on the solution pH, the electrode surface can bear net negative, or    positive, or no charge. In 0.04 M KSCN solution (pH 6.8), therefore oxide surface    is positively charged. This positive charge of the electrode surface at <I>E</I><SUB>corr</SUB>    was further confirmed via defining the position of <I>E</I><SUB>corr</SUB> with    respect to the respective PZC (<I>E</I><SUB>q= 0</SUB>) <sup><a name="top41"></a><a href="#41">[41-43]</a></sup>.    When the difference u = [(<I>E</I><SUB>corr</SUB> &#8722; <I>E</I><SUB>q= 0</SUB>    = 0) is negative, the electrode surface acquires a negative net charge and the    adsorption of cations is favoured. On the contrary, the adsorption of anions    is favoured when u becomes positive. </P>     <P >It has been shown in the literature that ac impedance studies can be used    to evaluate the PZC from the capacitance (<I>C</I><SUB>dl</SUB>) versus applied    potential (<I>E</I>) plot <sup><a href="#41">[41-43</a></sup>, <sup><a name="top44"></a><a href="#44">44]</a></sup>.    <a name="f12"></a><a href="#topf12">Fig. 12</a> represents the variation of    <I>C</I><SUB>dl</SUB> with <I>E</I> recorded for Al in 0.04 M KSCN solution    in the absence (curve 1) and presence (curve 2) of 5x10<SUP>-3</SUP> M Gly.    The minima on the <I>C</I><SUB>dl</SUB> versus <I>E</I> curves are considered    as the value of PZC of the electrode. It is obvious from Fig. 12 that the surface    charge of Al in KSCN solutions at the free corrosion potential is positive (u    = [&#8722;(1495) &#8722; (&#8722;1580) = + 85 mV(SCE)]).</P>     <P >In absence of Gly, this positive charge of the oxide film may favour the electrostatic    adsorption of the aggressive SCN<SUP>-</SUP> anions. The adsorbed SCN<SUP>-</SUP>    anions may cooperate, as previously mentioned, with the increased alkalinity    of the solutions (due to reactions 4 and 5) to dissolve and damage the passive    layer (inspect again the SEM image presented in <a name="f3"></a><a href="#topf3">Fig.    3b</a>). </P>     <P >Regarding to Fig. 12, Al surface carries positive excess charge in 0.04 M    KSCN solutions (curve 1), whereas negative excess charge is carried on the Al    surface in the presence of Gly (curve 2), (u = [&#8722;(1550) &#8722; (&#8722;1490)    = &#8722; 60 mV(SCE)]). These results indicate that when adding Gly to KSCN    solution, Gly molecules (with its positive center, namely the protonated amino    group) quickly adsorb electrostatically at the oxide/solution interface through    electrostatic attraction force because of the excess negative charge (due to    the adsorbed layer of the SCN<SUP>-</SUP> anions) at this interface at the corrosion    potential. Due to this electrostatic adsorption, part of the positive charges    on the metal surface is shielded. It is not surprising now to understand why    the PZC is shifted positively in presence of Gly (see again curve 2 in <a href="#topf12">Fig.    12</a>). This adsorption of Gly impedes further adsorption of the aggressive    SCN<SUP>-</SUP> anions (inspect again the EDX spectra presented in <a href="#topf4">Figs.    4</a> and <a name="f11" id="f11"></a><a href="#topf11">11</a>). Thus the electrode    is protected against corrosion. </P>     <P >In addition to this physical (electrostatic) adsorption, there should be chemisorption    assisted by hydrogen bonding. This H-bond may be formed between the protonated    N&#8211;H linkages in the Gly structure and the oxygen atoms of the passive    film. This type of adsorption is expected to be effective, because the positive    charge on the N-atom is conductive to the formation of hydrogen bonds. However,    this type of adsorption requires sensitive surface analysis, like FT-IR and    XPS, to be confirmed. This being one aspect that deserves further investigation.  </P>     <P >It seems that the adsorbed layer of Gly is not well-protective; it may be    porous, cracked or something else: inspect again SEM images presented in <a name="f3"></a><a href="#topf3">Figs.    3</a> and <a name="f10"></a><a href="#topf10">10</a>. In addition, the S signal    (due to the adsorption of aggressive SCN<SUP>-</SUP> anion) is still visible    in the EDX spectra, even at high concentrations of Gly (see <a href="#topf4">Figs.    4</a> and <a href="#topf11">11</a>). This means that the Gly layer is not protective    enough to completely prevent the adsorption of SCN<SUP>-</SUP> anions. </P>     ]]></body>
<body><![CDATA[<P >These findings confirm the results obtained from the OCP vs. time plots (<a name="f5" id="f5"></a><a href="#topf5">Fig.    5</a>) that Gly, under the operating conditions, is not enough to ensure permanent-corrosion    inhibition. This is the reason why a new Gly derivative is synthesized in our    lab in order to effectively inhibit the corrosion of Al in the aggressive SCN<SUP>-</SUP>    solutions. Promising results were obtained with this new Gly derivative and    will be presented in a full separate paper.</P>     <P >&nbsp;</P>     <P ><B>Conclusion</B></P>     <P >This work reports results of ICP-AES method of chemical analysis, Tafel polarization    and cyclic polarization on the ability of glycine (Gly) to inhibit uniform and    pitting corrosion processes of Al in aerated non-stirred 0.04 M KSCN solutions    at 25 <SUP>o</SUP>C. These studies have shown that Gly is able to inhibit uniform    and pitting corrosion of Al in KSCN solutions, as indicated by the decrease    in the corrosion current and the increase in the pitting potential. Inhibition    efficiency is a function of Gly concentration. The inhibition by Gly is proposed    to be due to the formation of a Gly adsorbed film on the metal surface that    protects the metal against the aggressive attack of SCN<SUP>-</SUP> anions.    Scanning electron microscopy (SEM) and energy dispersion X-ray (EDX) observations    of the electrode surface confirmed the existence of such an adsorbed film.</P>     <P >&nbsp;</P>     <P ><B>References </B></P>     <!-- ref --><P  ><a href="#top1">1</a><a name="1"></a>. G.A. Capauano, W.G. Davenport, <I >J.    Electrochem. Soc.</I> 118 (1971) 1688. [10.1007/BF00620581]&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=000149&pid=S0872-1904201000020000300001&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --><P  ><a href="#top1">2</a>. P. Fellener, M.C. Paucivova, K. Mataisovsky, <I >Surf.    Technol.</I> 14 (1981) 101.</P>     <P ><a href="#top1">3</a>. C.-C. Yang, Mater. Chem. Phys. 37 (1994) 355. [10.1016/0254-0584(94)90175-9]</P>     <P  ><a href="#top4">4</a><a name="4"></a>. M.A. Amin, S.S. Abd El-Rehim, E.E.F. El-Sherbini,    <I  >Electrochim. Acta</I> 51 (2006) 4754. [10.1016/j.electacta.2006.01.015]</P>     ]]></body>
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<body><![CDATA[<P >&nbsp;</P>     <P >Received 17 March 2010; accepted 11 May 2010</P>     <P >&nbsp;</P>     <P ><a href="#topc1">*</a><a name="c1"></a>Corresponding author: <a href="mailto:maaismail@yahoo.com">maaismail@yahoo.com</a></P>      ]]></body><back>
<ref-list>
<ref id="B1">
<nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Capauano]]></surname>
<given-names><![CDATA[G.A.]]></given-names>
</name>
<name>
<surname><![CDATA[Davenport]]></surname>
<given-names><![CDATA[W.G.]]></given-names>
</name>
</person-group>
<source><![CDATA[J. Electrochem. Soc.]]></source>
<year>1971</year>
<volume>118</volume>
<page-range>1688</page-range></nlm-citation>
</ref>
</ref-list>
</back>
</article>
